Next generation, very high efficiency thin silicon cells. A new type of thin silicon solar cell, with an efficiency potential of 21% or greater, is to be developed and characterized.
These cells should be cheaper, and have better efficiency, power to weight ratio and radiation tolerance than existing commercial silicon solar cells opening interesting possible applications. Novel solar cell designs and associated interconnection and encapsulation schemes for the cells suitable for space and hi ....Next generation, very high efficiency thin silicon cells. A new type of thin silicon solar cell, with an efficiency potential of 21% or greater, is to be developed and characterized.
These cells should be cheaper, and have better efficiency, power to weight ratio and radiation tolerance than existing commercial silicon solar cells opening interesting possible applications. Novel solar cell designs and associated interconnection and encapsulation schemes for the cells suitable for space and high altitude aircraft applications superior to existing technologies are expected to be developed. This should lead to a new, internationally competitive Australian industry.
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Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0560683
Funder
Australian Research Council
Funding Amount
$321,953.00
Summary
A furnace stack for advanced photovoltaic, photonic and microfabrication applications. Advanced silicon photovoltaic, photonic, optoelectronic and micro-electromechanical devices require state of the art processing equipment for the deposition of thin dielectric films and for controlled doping of the devices. Key techniques include the deposition of stoichiometric and silicon rich silicon nitride and silicon dioxide films, and the controlled wafer doping with boron and phosphorus. A state of the ....A furnace stack for advanced photovoltaic, photonic and microfabrication applications. Advanced silicon photovoltaic, photonic, optoelectronic and micro-electromechanical devices require state of the art processing equipment for the deposition of thin dielectric films and for controlled doping of the devices. Key techniques include the deposition of stoichiometric and silicon rich silicon nitride and silicon dioxide films, and the controlled wafer doping with boron and phosphorus. A state of the art furnace stack is to be procured which will satisfy these requirements on industrially relevant wafer sizes up to 150mm. The equipment will support a broad range of research projects in the above fields, ranging from fundamental investigations to applied research carried out in collaboration with industry partners.Read moreRead less