Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0667994
Funder
Australian Research Council
Funding Amount
$1,000,000.00
Summary
National Nanolithography Facility. Nanotechnology is expected to have a major impact on quality of life and global economy. It is predicted to generate revenues as big as the ICT sector in 20 years time. The National Nanolithography Facility will enhance the Australian capability in the field of nanoscale science and technology. This will enable Australian researchers to achieve major impacts in many areas of nanotechnology with a strong potential impact on industry sectors such as computers, ....National Nanolithography Facility. Nanotechnology is expected to have a major impact on quality of life and global economy. It is predicted to generate revenues as big as the ICT sector in 20 years time. The National Nanolithography Facility will enhance the Australian capability in the field of nanoscale science and technology. This will enable Australian researchers to achieve major impacts in many areas of nanotechnology with a strong potential impact on industry sectors such as computers, communications, defence, health, bio-security. This facility has the potential for developing new technologies of fundamental as well as applied interest.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE200100071
Funder
Australian Research Council
Funding Amount
$535,000.00
Summary
Photonic Chip Integration Facility. This project will create a Photonic Chip Integration Facility responding to newly emerging global trends towards low loss waveguides and wider coverage of the optical spectrum.
The tool will grow ultrahigh quality silicon nitride and oxide thin films in a manner that is compatible with electronics and other delicate materials, balancing flexibility for materials exploration with reliability and repeatability required for photonic chip systems research. The pr ....Photonic Chip Integration Facility. This project will create a Photonic Chip Integration Facility responding to newly emerging global trends towards low loss waveguides and wider coverage of the optical spectrum.
The tool will grow ultrahigh quality silicon nitride and oxide thin films in a manner that is compatible with electronics and other delicate materials, balancing flexibility for materials exploration with reliability and repeatability required for photonic chip systems research. The proposed facility will support Australian researchers from diverse disciplines spanning broadband networks, sensing, quantum technology, materials science, and beyond while providing a clear path for translating discoveries out of the lab towards scale up industrial manufacture
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