Monolithic Integration of Silicon Waveguide and Ge1-xSix Photodetector on Silicon-on Insulator Platform for Intra-chip Optical Interconnect. Photonics has become the major technology underpinning the communication and storage of data. As photonics advances applications are emerging which demand components be manufactured cheaply in the manner achieved by the electronics industry in the silicon chip. Silicon is now emerging as an important photonic material and devices can benefit from inexpensiv ....Monolithic Integration of Silicon Waveguide and Ge1-xSix Photodetector on Silicon-on Insulator Platform for Intra-chip Optical Interconnect. Photonics has become the major technology underpinning the communication and storage of data. As photonics advances applications are emerging which demand components be manufactured cheaply in the manner achieved by the electronics industry in the silicon chip. Silicon is now emerging as an important photonic material and devices can benefit from inexpensive processing methods developed for electronics. This project aims to capture key intellectual property for monolithically integrating key photonic components onto a silicon platform. The project can bring social and commercial benefits to Australia such as high-level research and training in nanotechnology as well as opportunities for commercialisation in niche markets.Read moreRead less
Discovery Early Career Researcher Award - Grant ID: DE140100805
Funder
Australian Research Council
Funding Amount
$395,220.00
Summary
Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing. This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light ....Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing. This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light supporting material aerographite that has a state-of-the-art ratio value of Young's modulus to cubic density. It will also develop a new inorganic nanoparticle resist with ultra-low dose. These building blocks will enhance RIPEL's throughput by four orders of magnitude. The project will contribute to making processors or solid state storage cheaper and more efficient.Read moreRead less
Novel Silicon-Based Photonic Devices. Silicon's pre-eminence in high-speed digital electronics does not extend to optoelectronics where the demand is for devices that can generate, guide, detect and process light. However, the properties of silicon are dramatically altered when it is reduced to nanometre dimensions. Advances in the understanding of such effects and in the fabrication and application of nanoscale silicon have provided the prospect of new and innovative Si-based photonic devices, ....Novel Silicon-Based Photonic Devices. Silicon's pre-eminence in high-speed digital electronics does not extend to optoelectronics where the demand is for devices that can generate, guide, detect and process light. However, the properties of silicon are dramatically altered when it is reduced to nanometre dimensions. Advances in the understanding of such effects and in the fabrication and application of nanoscale silicon have provided the prospect of new and innovative Si-based photonic devices, and of fully integrated electronic and photonic functionality. This project aims to extend the understanding of nanoscale silicon and to develop and prototype novel Si-based photonic devices based on this material.Read moreRead less
Ion implantation engineered photonic devices for use in highly integrated silicon optoelectronic circuits. This project establishes a collaboration with Canada's leading integrated silicon photonics research group thus tapping into years of valuable experience transferable to Australian-based researchers. The involvement of students as well as early career researchers ensures a new generation of Australian experts in this field. The importance of silicon photonics means that Australia must estab ....Ion implantation engineered photonic devices for use in highly integrated silicon optoelectronic circuits. This project establishes a collaboration with Canada's leading integrated silicon photonics research group thus tapping into years of valuable experience transferable to Australian-based researchers. The involvement of students as well as early career researchers ensures a new generation of Australian experts in this field. The importance of silicon photonics means that Australia must establish a strong research program in the area to maintain its current position as being at the forefront of leading-edge research. This is only possible through collaborations such as that proposed here.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0347464
Funder
Australian Research Council
Funding Amount
$100,000.00
Summary
Setting up an integrated wirebonding and testing facility for MEMS applications. This project intends to setup an integrated wire bonding and testing facility suitable for Micro electromechanical systems (MEMS) applications. Wire bonding is an essential step for making the contacts of any micro device with external power supply or signal conditioning circuitry. The contact pads for such devices vary in size from 0.050 mm x 0.050 mm to few 100s of micrometers. The proposed facility will be requi ....Setting up an integrated wirebonding and testing facility for MEMS applications. This project intends to setup an integrated wire bonding and testing facility suitable for Micro electromechanical systems (MEMS) applications. Wire bonding is an essential step for making the contacts of any micro device with external power supply or signal conditioning circuitry. The contact pads for such devices vary in size from 0.050 mm x 0.050 mm to few 100s of micrometers. The proposed facility will be required for making contacts either using thermal or ultrasonic methods with complete automatic stages. The electrical contacts are used to drive or monitor MEMS, Polymer micro devices and nano- fluidic systems. This facility will be used for different applications including photonics and communication devices (RMIT), flexi circuits and microwave devices (DSTO) and micro/nano fluidic systems (SUT). This will be the only advanced integrated facility in Victoria, which will have the wire bonding(ball & wedge), die bonding and bond testing facilities together.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0775562
Funder
Australian Research Council
Funding Amount
$500,000.00
Summary
The Melbourne Nanofabrication Facility. Australia is desperately short of facilities for actual fabrication, prototyping and construction of advanced micromechanical and nanoscale systems. This is impeding both academic researchers and industrial developers in the materials, optics and biotechnological industries. The proposed instrument would complete the development of Australia's newest high resolution microscopy centre and enable a wide range of users to image, measure, build and design comp ....The Melbourne Nanofabrication Facility. Australia is desperately short of facilities for actual fabrication, prototyping and construction of advanced micromechanical and nanoscale systems. This is impeding both academic researchers and industrial developers in the materials, optics and biotechnological industries. The proposed instrument would complete the development of Australia's newest high resolution microscopy centre and enable a wide range of users to image, measure, build and design complex nanostructures at the atomic level and upwards. Read moreRead less
Structural Characterization of Ion Beam Synthesized Metallic Nanocrystals using Advanced Synchrotron based Analytical Techniques. Metallic nanocrystals formed by ion implantation represent a highly relevant class of nanomaterials with significant potential applications in communication technology. A detailed understanding of the structure of such crystals, as proposed in the project, will yield considerable information for efficient utilization of ion beam synthesized nanocrystals. This will enh ....Structural Characterization of Ion Beam Synthesized Metallic Nanocrystals using Advanced Synchrotron based Analytical Techniques. Metallic nanocrystals formed by ion implantation represent a highly relevant class of nanomaterials with significant potential applications in communication technology. A detailed understanding of the structure of such crystals, as proposed in the project, will yield considerable information for efficient utilization of ion beam synthesized nanocrystals. This will enhance Australia's strength in nanotechnology and materials science and create the potential for technical innovation. Furthermore, this project will produce significant know-how in synchrotron based analytical techniques which is invaluable with respect to future research at the forthcoming Australian synchrotron facility.Read moreRead less
A fundamental study of electronic transport in advanced semiconductor nanostructures. The principal aim of this project is to attract and retain very high calibre early career researchers by providing them with the best-available infrastructure and research environment, combined with world-class supervision and mentoring. The project brings together an outstanding team of international collaborators, who will work with the early career researchers to ensure that they are trained and mentored at ....A fundamental study of electronic transport in advanced semiconductor nanostructures. The principal aim of this project is to attract and retain very high calibre early career researchers by providing them with the best-available infrastructure and research environment, combined with world-class supervision and mentoring. The project brings together an outstanding team of international collaborators, who will work with the early career researchers to ensure that they are trained and mentored at an international level. The new science, novel characterisation methods, and theoretical models that are outcomes of this project will provide new opportunities and expertise to advance the strategic defence and national security interests of Australia, and the emerging Australian semiconductor device and solar cell industry. Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE100100048
Funder
Australian Research Council
Funding Amount
$340,000.00
Summary
Nanoscale optical microscopy facility. The optical microscope has enabled us to see micro-objects, leading to revolutionary discoveries in medicine and natural sciences. However, the smallest object resolved by a microscope is limited by the wavelength of light. To see nanoscale objects smaller than the wavelength, a new tool for nano-imaging is needed. This project will establish a nanoscale optical microscopy facility that will reveal the topology and true colours of the nano-objects. Such inf ....Nanoscale optical microscopy facility. The optical microscope has enabled us to see micro-objects, leading to revolutionary discoveries in medicine and natural sciences. However, the smallest object resolved by a microscope is limited by the wavelength of light. To see nanoscale objects smaller than the wavelength, a new tool for nano-imaging is needed. This project will establish a nanoscale optical microscopy facility that will reveal the topology and true colours of the nano-objects. Such information, achieved through spectroscopic analysis of the light emitted or scattered at the nanoscale, will uncover some of the most fundamental aspects of the nanoworld, leading to cutting-edge scientific discoveries and important industrial applications in photonics and solar energy.Read moreRead less
Ion implantation induced diffusion and defect evolution in Si nanostructures. A fundamental understanding of nanostructures is essential for the development of nanoscale electronic devices. This project will investigate ion implantation of dopant atoms into Si nanostructures. The goal is to develop a broad understanding of the effect of the nanostructure dimensions on point-defect-induced diffusion and the formation of extended defects. In particular, the influence of multiple surfaces on point- ....Ion implantation induced diffusion and defect evolution in Si nanostructures. A fundamental understanding of nanostructures is essential for the development of nanoscale electronic devices. This project will investigate ion implantation of dopant atoms into Si nanostructures. The goal is to develop a broad understanding of the effect of the nanostructure dimensions on point-defect-induced diffusion and the formation of extended defects. In particular, the influence of multiple surfaces on point-defect recombination will be investigated. Concurrently, the techniques necessary for the analysis of nano-structures will be developed.
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