Discovery Early Career Researcher Award - Grant ID: DE220100487
Funder
Australian Research Council
Funding Amount
$450,000.00
Summary
Thermal hotspots detection in nanoscale two-dimensional electronics. The emergence of flexible nanoelectronics holds the promise to impact the way we live—from smart wearables to foldable smartphones. However, heat dissipation in the atomically-thin materials used for their conception has remained poorly understood due to their planar structures. This project aims at the detection and mapping of nanoscale thermal hotspots in flexible nanoelectronics devices using a two-dimensional-based optical ....Thermal hotspots detection in nanoscale two-dimensional electronics. The emergence of flexible nanoelectronics holds the promise to impact the way we live—from smart wearables to foldable smartphones. However, heat dissipation in the atomically-thin materials used for their conception has remained poorly understood due to their planar structures. This project aims at the detection and mapping of nanoscale thermal hotspots in flexible nanoelectronics devices using a two-dimensional-based optical thermometer. The expected outcome of this project is the development of a non-invasive thermometric technology that enables locating these critical nanoscale hotspots with nanoscale precision. This will lead to better design and manufacturing strategies for heat dissipation in these devices.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE150100172
Funder
Australian Research Council
Funding Amount
$270,000.00
Summary
Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high ....Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high rates of throughput so this etcher will be a crucial enabling tool for efficient fabrication of nano-devices for research into quantum computing, high bandwidth, quantum-secure optical communications, renewable energy, and for applications in medicine. The etcher will be available for national access.Read moreRead less